LEUVEN (Belgium), February 24, 2025— This week at SPIE Advanced Lithography + Patterning, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography. Measurements on both serpentine and fork-fork metallized structures show good electrical yield, indicative of a low number of stochastic defects. The e-test resu...