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Nanoimprint Lithography Aims to Take on EUV

In September, Canon shipped the first commercial version of a technology that could one day upend the making of the most advanced silicon chips. Called nanoimprint lithography (NIL), it’s capable of patterning circuit features as small as 14 nanometers—enabling logic chips on par with Intel, AMD, and Nvidia processors now in mass production.The NIL system offers advantages that may challenge the US $150 million machines that dominate today’s advanced chipmaking today, extreme ultraviolet (EUV) l...

Read more at spectrum.ieee.org

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