ASML has again announced plans for a new lithography tool that will extend design limits for the highest transistor-density chips. The company’s former president, Martin van den Brink, surprised experts with the announcement of the new “Hyper-NA” EUV technology that is still in the early stages of development, according to global R&D organization imec, which has worked closely with ASML. Hyper-NA would follow the High-NA systems that ASML installed early this year for the first time at an Intel ...