In April 2024 I pulled on a bunny suit at Intel’s D1X fab in Hillsboro, Oregon, and stood a few feet from a machine the size of a bus and worth a small nation state. Intel Fellow Mark Phillips explained this was ASML’s first High-NA EUV scanner, 165 tons of it. Installation had just wrapped and calibration had begun, but realistically still another few months before test wafers could be run. Intel were actually only a few weeks ahead of ASML in terms of installing a tool, enabling a close collab...