(Image credit: Intel) Late last year, ASML began shipping its first high-NA extreme ultraviolet (EUV) lithography system to Intel, and this past weekend, the processor giant published a video covering the installation of the tool into its fab near Hillsboro, Oregon. The machine will be used primarily for research and development purposes.ASML's Twinscan EXE:5000 High-NA EUV machine is indeed absolutely massive. In total, 250 crates are required to transport the machine, which weighs in the neigh...